DisChem provides innovative chemical solutions for advanced lithographic manufacturing.
Why You Choose Us
DisChem provides innovative chemical solutions for advanced lithographic manufacturing. From hologram, optical media, to state of the art microlithography and e-beam manufacturing, DisChem has chemical solutions to increase yield and reduce cost and process waste.
DisCharge is an anti-charging agent used in electron-beam lithography for preventing charge accumulation on electrically insulated substrates.
E-Form is an electronic grade sulfamate nickel low stress electroforming concentrate designed and manufactured specifically for use in electronics manufacturing
SurPass is a waterborne agent designed to promote adhesion and improve overall coating quality on a broad range of substrate materials used in photon and electron beam lithography.
DisClean is a cationic surface active agent designed to remove water stains, oxidation products, organic residues and electrostatic contaminants from optical electroforms and substrates.
NEW PRODUCT!
Negative Tone EBL Resist
DisChem HSQ is a tone electron beam hydrogen silesquioxane resist derived from dry silica resin (H-SiOx) in semiconductor grade MIBK carrier solvent for use in electron beam lithography (EBL). H-SiQ is characterized by excellent pitch resolution, sensitivity and etch resistance for direct write thin film EBL applications.
Immediate availability: lead time less than one week with 100% shelf life!
What We Do Now
SurPass Cationic Microlithograph Adhesion Promoters / Piming Agents for superior resist adhesion in a non-hazardous waterborne product. Read More
DisCharge anti-charging agents for prevention of charge accumulation on insulated substrates in electron beam lithography.
StamperPrep Soak / Electroclean / Electrolytic Passivation Compound for photoresist removal,
DisClean Optical Substrate Cleaner safety dissolves and removes ionized contaminants such water stains and electrostatically charged particles.
E-Form familiy of electronic grade nickel sulfamate chemistries and additives for optimum high-purity, low-stress electroforming applications. In addition, DisChem provides Analytical Services for the analysis and optimization of nickel sulfamate electroforming solutions.
DisChem HSQ is a tone electron beam hydrogen silesquioxane resist derived from dry silica resin (H-SiOx) in semiconductor grade MIBK carrier solvent for use in electron beam lithography (EBL).
OUR NEWS & BLOG
DisChem specializes in providing advanced chemical solutions for lithographic manufacturing. Whether it is hologram production,...
When precision matters in advanced lithography, Lithography Resist Adhesion becomes a critical factor for successful...
Are you looking for effective electroforming solutions that can enhance your manufacturing processes? Finding the...
Testimonial
With my skill set, knowledge and work ethics I could be a great addition to the team to deliver the best result.
