DisChem provides innovative chemical solutions for advanced lithographic manufacturing.
Why You Choose Us
DisChem provides innovative chemical solutions for advanced lithographic manufacturing. From hologram, optical media, to state of the art microlithography and e-beam manufacturing, DisChem has chemical solutions to increase yield and reduce cost and process waste.
DisCharge is an anti-charging agent used in electron-beam lithography for preventing charge accumulation on electrically insulated substrates.
E-Form is an electronic grade sulfamate nickel low stress electroforming concentrate designed and manufactured specifically for use in electronics manufacturing
SurPass is a waterborne agent designed to promote adhesion and improve overall coating quality on a broad range of substrate materials used in photon and electron beam lithography.
DisClean is a cationic surface active agent designed to remove water stains, oxidation products, organic residues and electrostatic contaminants from optical electroforms and substrates.
NEW PRODUCT!
Negative Tone EBL Resist
DisChem HSQ is a tone electron beam hydrogen silesquioxane resist derived from dry silica resin (H-SiOx) in semiconductor grade MIBK carrier solvent for use in electron beam lithography (EBL). H-SiQ is characterized by excellent pitch resolution, sensitivity and etch resistance for direct write thin film EBL applications.
Immediate availability: lead time less than one week with 100% shelf life!
What We Do Now
SurPass Cationic Microlithograph Adhesion Promoters / Piming Agents for superior resist adhesion in a non-hazardous waterborne product. Read More
DisCharge anti-charging agents for prevention of charge accumulation on insulated substrates in electron beam lithography.
StamperPrep Soak / Electroclean / Electrolytic Passivation Compound for photoresist removal,
DisClean Optical Substrate Cleaner safety dissolves and removes ionized contaminants such water stains and electrostatically charged particles.
E-Form familiy of electronic grade nickel sulfamate chemistries and additives for optimum high-purity, low-stress electroforming applications. In addition, DisChem provides Analytical Services for the analysis and optimization of nickel sulfamate electroforming solutions.
DisChem HSQ is a tone electron beam hydrogen silesquioxane resist derived from dry silica resin (H-SiOx) in semiconductor grade MIBK carrier solvent for use in electron beam lithography (EBL).
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FAQs
Our solutions are designed to increase yield, reduce costs, and minimize process waste, enhancing the efficiency and profitability of your manufacturing operations.
E-beam manufacturing involves using electron beams for precise nanoscale patterning. DisChem provides specialized chemical solutions to optimize e-beam processes, ensuring high-quality results and reliability.
Microlithography is a technique used to create microscale patterns on surfaces. DisChem offers advanced chemical solutions to enhance the precision and yield of microlithography processes.
By reducing process waste and optimizing manufacturing efficiency, DisChem's solutions help minimize environmental impact while improving production outcomes.
Yes, DisChem works closely with clients to develop tailored chemical solutions that meet their unique manufacturing requirements and challenges.
DisChem's solutions are beneficial for industries involved in hologram production, optical media, microlithography, and e-beam manufacturing, including semiconductor and nanotechnology sectors.
DisChem maintains high-quality standards through rigorous testing and quality control processes, ensuring that all solutions meet the highest performance and safety criteria.
Yes, DisChem provides comprehensive technical support to help clients integrate our solutions effectively and optimize their manufacturing processes.
You can contact DisChem through their website or by reaching out directly via phone or email to discuss your specific needs and learn more about their products and services.
