Warning: Trying to access array offset on value of type null in /home/websiteb/discheminc.com/wp-content/plugins/better-wp-security/core/modules/security-check-pro/class-itsec-security-check-pro.php on line 52 Photolithography in nanotechnology Archives - DisChem Inc
Photolithography is one of the most popular methods to create nanoscale circuit components. Nicephore Niepce, a French scientist, developed the first photoresist in 1820. This component is fundamental to photolithography in nanotechnology. Photoresists are substances...
DisChem provides innovative chemical solutions for advanced lithographic manufacturing. From hologram, optical media, to state of the art microlithography and e-beam manufacturing, DisChem has chemical solutions to increase yield and reduce cost and process waste.