DisChem provides innovative chemical solutions for advanced lithographic manufacturing. From hologram, optical media, to state of the art microlithography and e-beam manufacturing,
DisChem has chemical solutions to increase yield and reduce cost and process waste.
Equipped & trained to work in the hospitals, the diagnostic labs & healthcares.
DisChem H-SiQ is a negative tone hydrogen silesquioxane resist derived from dry silica resin (H-SiOx) in semiconductor grade MIBK carrier solvent for use in electron beam
lithography (EBL). H-SiQ is characterized by excellent pitch resolution, sensitivity and etch resistance for direct write thin film EBL applications.
DisCharge is an anti-charging agent used in electron-beam lithography for preventing charge accumulation on electrically insulated substrates.