E-Beam Lithography Anti-Charging Agents

Discharge

DisCharge is an anti-charging agent used in electron-beam lithography for preventing charge accumulation on electrically insulated substrates. DisCharge is water based and easily removed with water or IPA. DisCharge H2O is available in standard (1X), 2X and 4X formulations with film thickness doubling and sheet decreasing proportionally to the incremental increase in concentration.

Electron Beam Lithography Charge? DisChem’s DisCharge is Here to Help!

Do you struggle with charge accumulation that disrupts the accuracy of your beam? At DisChem, we understand these frustrations and are here to help. Our advanced solutions tackle these issues head-on, ensuring you achieve precision and efficiency in your lithography projects.

Meet DisCharge: Your Solution to Charge Accumulation

One of our standout products is DisCharge, a spin-on anti-charging agent specifically designed for electron beam lithography. This innovative solution helps reduce charge accumulation on insulating substrates, which is a common problem in EBL processes. By addressing this issue, DisCharge ensures better positional accuracy and improved lithographic outcomes.

Why Use an E Beam Lithography Charge Dissipation Agent?

Have you ever noticed that your lithographic patterns suffer from poor fidelity or unexpected distortions? This is often due to charge accumulation on insulating substrates like fused silica, glass slides, and PDMS. Our E Beam Lithography Charge Dissipation Agent, DisCharge, is designed to mitigate these problems. It works seamlessly with positive resists such as PMMA, ZEP520A, CSAR 62, and mr-PosEBR, ensuring that charge accumulation does not compromise your work.

The Benefits of Using DisCharge

  • Enhanced Positional Accuracy : By reducing charge accumulation, DisCharge improves the precision of your electron beam.
  • Improved Pattern Fidelity :Achieve the exact patterns you design, free from distortions caused by charge buildup.
  • Versatile Application :DisCharge is effective on various substrates and compatible with multiple resist types.

Evidence of Effectiveness

The effectiveness of DisCharge as an EBL Charge Dissipation Agent is backed by solid evidence. In experiments conducted with different resists and substrates, DisCharge consistently prevented charge accumulation, resulting in better pattern fidelity and substrate integrity. Whether working with PMMA, ZEP520A, or CSAR 62, DisCharge ensures that your electron beam lithography processes deliver the high-quality results you need.

Real-World Results

  • 300 nm PMMA 950 A4 on PDMS : Without DisCharge, charge accumulation caused cracks in the PDMS. With DisCharge, no charge accumulation was observed, and the structure appeared as expected.
  • 300 nm mr-PosEBR on Glass Slide :Without DisCharge, poor shape fidelity was evident. With DisCharge, the patterns were accurate and as expected.
  • 200 nm ZEP520A on Glass Slide :DisCharge prevented charge accumulation, ensuring the desired pattern fidelity and resist crosslinking at high doses.

EBL Charge Dissipation

DisCharge has been extensively tested and proven to be effective at the Singh Center for Nanotechnology Quattrone Nanofabrication Facility. Researchers Gerald G. Lopez, Ph.D., and Glen de Villafranca have documented the remarkable performance of DisCharge, in reducing charge accumulation during EBL processes. Their studies show significant improvements in pattern accuracy and substrate integrity when using DisCharge.

Evidence of Effectiveness

The effectiveness of DisCharge as an EBL Charge Dissipation Agent is backed by solid evidence. In experiments conducted with different resists and substrates, DisCharge consistently prevented charge accumulation, resulting in better pattern fidelity and substrate integrity. Whether working with PMMA, ZEP520A, or CSAR 62, DisCharge ensures that your electron beam lithography processes deliver the high-quality results you need.

How Does DisCharge Work?

  • Application : Spin coat DisCharge onto your substrate as per the resist protocol. No pre-bake is required.
  • Exposure :Mount the sample in your EBL tool and ensure the grounding clip is properly touching the sample surface. Proceed with your pattern exposure.
  • Removal :After exposure, DisCharge can be easily removed using various methods such as spin rinse, sink rinse, or solvent rinse.

DisCharge: Spin-On Anti-Charging Agent for Electron Beam Lithography

Our DisCharge product has been thoroughly tested at the Singh Center for Nanotechnology, where it demonstrated its ability to reduce charge accumulation on insulating substrates. This reduction in charge buildup leads to improved positional accuracy of the electron beam and better overall lithographic performance. DisCharge has been shown to be effective on substrates like fused silica, glass slides, and PDMS, making it a versatile solution for a wide range of applications.

Still Need Help!

At DisChem, we are dedicated to providing solutions that enhance your lithography processes. DisCharge, our advanced Electron Beam Lithography Charge dissipation agent, addresses the critical issue of charge accumulation, ensuring better pattern accuracy and substrate integrity. With DisCharge, you can achieve the precision and efficiency your projects demand.

Ready to improve your lithography results? Contact us today to learn more about DisCharge and our other innovative products. Let’s tackle your lithography challenges together.

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