E-Beam Lithography Anti-Charging Agents

DisCharge

DisCharge is an anti-charging agent used in electron-beam lithography for preventing charge accumulation on electrically insulated substrates. DisCharge is water based and easily removed with water or IPA. DisCharge H2O is available in standard (1X), 2X and 4X formulations with film thickness doubling and sheet decreasing proportionally to the incremental increase in concentration.
PMMA 950 A4 / PDMS / Si without anti-charging agent
PMMA 950 A4 / PDMS / Si ​with DisCharge
300 nm CSAR62 on glass side without charge dissipation agent
300 nm CSAR62 on glass with DisCharge
300 nm mr-PosEBR on glass slide without anti-charging agent
300 nm mr-PosEBR on glass with DisCharge
200 nm ZEP 520A on glass slide without charge dissipation agent
200 nm ZEP 520A on glass slide with DisCharge
HSQ on fused silica with DisCharge. Pattern not possible without charge dissipation.
300 nm SML300 on glass slide without charge dissipation agent
300 nm SML300 on glass slide
with DisCharge 2X