Resist Materials

NEW PRODUCT!

Negative Tone EBL Resist

A new product made using our micro manufacturing techniques. Derived from dry silica resin, our H-SIQ is a negative tone hydrogen silesquioxane resist. We use a micro fabrication process to create this product. It is especially suited to application in electron beam lithography. This is largely due to it having great etch resistance and sensitivity, in addition to being manufactured with our micro/nano fabrication process.

H-SiQ Application Sheet

Negative Tone EBL Resist - DisChem Inc