Resist Materials


Negative Tone EBL Resist

DisChem H-SiQ is a negative tone hydrogen silesquioxane resist derived from dry silica resin (H-SiOx) in semiconductor grade MIBK carrier solvent for use in electron beam lithography (EBL). H-SiQ is characterized by excellent pitch resolution, sensitivity and etch resistance for direct write thin film EBL applications.

Immediate availability: lead time less than one week with 100% shelf life!

H-SiQ Application Sheet

Negative Tone EBL Resist - DisChem Inc