… but at the beginning, the reality looked different!
It seemed that the 50nm and 30nm columns are under-dosed…
For the creation of the fields with 30nm and 50nm columns extremely high dose values up to 30,000µC/cm² were necessary. With these high doses the adhesion of the resist columns could be improved. But the pattern were oversized and showed strong footing.
The effects could not be explained with the spread of energy (proximity or process effect) alone. The adjustment of PEC parameter for increasing the exposure dose for small columns did not lead to the desired result (dimensions as designed). Consequence: Need to fix the adhesion issue of the small columns at low doses! Introduction of SurPass: – What it is – Why it works – How it works (how it is processed) After applying SurfScan…..
