H-SIQ

H-SIQ

DisChem HSQ is a tone electron beam hydrogen silesquioxane resist derived from dry silica resin (H-SiOx) in semiconductor grade MIBK carrier solvent for use in electron beam lithography (EBL).

  • Share:

Categories

Recent Posts

How SurPass Photoresist Adhesion Promoter Improves Pattern Stability in Advanced Microlithography

How SurPass Photoresist Adhesion Promoter Improves Pattern Stability in Advanced Microlithography

Feb 20, 2026

7 Critical Ways Electron Beam Charge Dissipation Improves E-Beam Lithography Performance

7 Critical Ways Electron Beam Charge Dissipation Improves E-Beam Lithography Performance

Feb 19, 2026

The Ultimate Guide to Boosting Your Yield with SurPass Microlithography Adhesion

The Ultimate Guide to Boosting Your Yield with SurPass Microlithography Adhesion

Jan 29, 2026

How Charge Management Influences Yield in Electron Beam Lithography?

How Charge Management Influences Yield in Electron Beam Lithography?

Jan 27, 2026

How Electron Beam Charge Dissipation Reduces Defects in High-Resolution E Beam Processes?

How Electron Beam Charge Dissipation Reduces Defects in High-Resolution E Beam Processes?

Jan 7, 2026

Popular Tags

No tags found.

Are You Looking to Buy Chemicals?

Inquire about our exciting new products and well priced commodities.

DisChem provides innovative chemical solutions for advanced lithographic manufacturing. From hologram, optical media, to state of the art microlithography and e-beam manufacturing, DisChem has chemical solutions to increase yield and reduce cost and process waste.

Useful Links

Our Products

Conect with us

Copyright © 2025 DisChem, Inc.. All rights reserved.