How SurPass Photoresist Adhesion Promoter Improves Pattern Stability in Advanced Microlithography
Feb 20, 2026
DisChem HSQ is a tone electron beam hydrogen silesquioxane resist derived from dry silica resin (H-SiOx) in semiconductor grade MIBK carrier solvent for use in electron beam lithography (EBL).
No tags found.
Inquire about our exciting new products and well priced commodities.
Copyright © 2025 DisChem, Inc.. All rights reserved.
