The Power of DisCharge H2O: A Must-Have for EBL!

Charge buildup is a common problem in electron-beam lithography (EBL). If you have dealt with issues like pattern distortion or poor accuracy, you know how frustrating it can be. That’s where DisCharge H2O steps in. This powerful anti-charging agent can help you solve these issues easily.

What Is DisCharge H2O?

DisCharge H2O, an anti-charging agent, is a special coating made to stop charge accumulation on non-conductive surfaces. It is a water-based solution that is simple to use and easy to remove with water or isopropyl alcohol (IPA). This makes it a great addition to your EBL process.

Why Is Charge Buildup a Problem?

Charge accumulation happens when an electron beam hits insulating materials like glass or PDMS (polydimethylsiloxane). This buildup can change your patterns and lead to errors. If you want to avoid these headaches in your work, DisCharge H2O is the answer. It helps you keep your lithography process smooth and accurate.

How to Use DisCharge H2O

Using DisCharge H2O is quick and easy. Start by spin coating it onto your substrate as part of your normal resist process. There is no need for a pre-bake. After that, place the sample in your EBL tool and ensure the grounding clip touches the surface. When you finish the exposure, you can rinse off DisCharge H2O easily. Just use a spin rinse, sink rinse, or solvent rinse. Your substrate will be clean and ready for the next step.

Real-World Results

At DisChem, we take effectiveness seriously. We have tested DisCharge H2O at the Singh Center for Nanotechnology. Our studies show impressive results. For example, in tests with 300 nm PMMA on PDMS, charge accumulation without DisCharge H2O led to cracks in the substrate. But with DisCharge H2O, we saw no charge buildup, and the structures stayed intact.

In another test with 300 nm mr-PosEBR on a glass slide, we noticed poor shape fidelity without DisCharge H2O. However, using DisCharge H2O gave us the exact patterns we expected. These results prove that DisCharge H2O works well in real situations.

Compatible with Different Resists

DisCharge H2O works well with many types of resists. Whether you use PMMA, ZEP520A, or CSAR 62, it fits into your process without any problems. This flexibility makes it easy to add to your existing setup.

The Benefits of Using DisCharge H2O

1. Better Accuracy: By reducing charge buildup, DisCharge H2O helps you place the electron beam more precisely.
2. Clear Patterns: Say goodbye to distortions and enjoy patterns that look just as you designed them.
3. Easy to Use: The application and removal are straightforward, making it a great choice for busy labs.
4. Versatile Application: DisCharge H2O works on many substrates and with different resist types, giving you great results every time.

Takeaway

DisCharge H2O is a must-have for anyone working in electron-beam lithography. It solves the charge buildup problem, so you can focus on making accurate patterns.

At DisChem, we are dedicated to providing smart solutions for advanced lithographic manufacturing. DisCharge H2O is one of many products we offer to help you succeed in EBL.

If you want to improve your lithography results and stop charge accumulation in its tracks, give DisCharge H2O a try. With its proven effectiveness and ease of use, it is a key part of your toolkit. Don’t let charge buildup hold you back; make DisCharge H2O your go-to E Beam Lithography Charge Dissipation Agent today!