Maximizing Precision with Electron Beam Nanolithography: Few Critical Insights!
Jan 21, 2025
DisChem HSQ is a tone electron beam hydrogen silesquioxane resist derived from dry silica resin (H-SiOx) in semiconductor grade MIBK carrier solvent for use in electron beam lithography (EBL).
Inquire about our exciting new products and well priced commodities.
Copyright © 2024 DisChem, Inc.. All rights reserved.
Automated page speed optimizations for fast site performance