H-SIQ

micro lithography inc

H-SIQ

DisChem HSQ is a tone electron beam hydrogen silesquioxane resist derived from dry silica resin (H-SiOx) in semiconductor grade MIBK carrier solvent for use in electron beam lithography (EBL).

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Hydrogen Silsesquioxane EBL Resist for Precision Lithography

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DisChem provides innovative chemical solutions for advanced lithographic manufacturing. From hologram, optical media, to state of the art microlithography and e-beam manufacturing, DisChem has chemical solutions to increase yield and reduce cost and process waste.

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